We developed a double slit method in order to reduce droplets that were a problem in pulsed laser deposition (PLD) of tantalum oxide. The tantalum oxide films were deposited using KrF excimer laser ablation of a Ta target in 5 mass% O3 at a pressure of 10 Pa. Stoichiometric and dense films with few droplets were obtained at a pressure of 10 Pa. Without double slit, as the laser pulses increased, the number of droplets containing rich metal on the film gets increased and its size became larger, and the surface morphology of the target also became more and more rugged. It was found that the number of droplet could be controlled by changing the initial roughness of the target. The number of droplets with a diameter size of under 1 μm was decreased to 1/10 of their sizes. Droplets larger than 3 μm, which mostly affect the corrosion resistance and hardly increase even beyond the laser pulses of 100 000. It is evident from this study that the double slit is a very effective method for reducing the droplets, which are otherwise a problem often seen in film production by PLD.
