A study of HF treated Si single crsytal surfaces with XPS (x-ray photoelectron spectroscopy)

Teguh, Rusyanto (1996) A study of HF treated Si single crsytal surfaces with XPS (x-ray photoelectron spectroscopy). Masters thesis, Nihon University.

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Item Type: Thesis (Masters)
Uncontrolled Keywords: Silicon crystals—Surfaces, Hydrofluoric acid—Industrial applications, X-ray photoelectron spectroscopy
Subjects: Physics
Materials Sciences
Divisions: OR_Nanoteknologi_dan_Material
Depositing User: Rasty -
Date Deposited: 16 Apr 2026 02:46
Last Modified: 16 Apr 2026 02:46
URI: https://karya.brin.go.id/id/eprint/54209

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