Development of multilayer ceramic capacitor by pulsed-laser deposition

Satoshi Tsuyuguchi; S. Mustofa; Takao Araki; Minoru Nishida; Takanori Hino

doi:10.1117/12.486580

19 February 2003 Development of multi layer ceramic capacitor by pulsed laser deposition

Satoshi Tsuyuguchi, S. Mustofa, Takao Araki, Minoru Nishida, Takanori Hino

Author Affiliations +

Proceedings Volume 4830, Third International Symposium on Laser Precision Microfabrication; (2003) https://doi.org/10.1117/12.486580
Event: LAMP 2002: International Congress on Laser Advanced Materials Processing, 2002, Osaka, Japan

Abstract

A thin film is a very attractive material in applications for capacitor material. Since the capacitance of multi layer capacitor is proportional to the number of dielectric layer and it is inversely as thickness, making thickness of film thin has a double advantage, in order to enlarge the capacitance. This research was performed thin film sizing and growth control of BaTiO₃, which are used as a dielectric. The increase of capacitance is predominant over the present value of 1nF.

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Satoshi Tsuyuguchi, Satoshi Tsuyuguchi, S. Mustofa, S. Mustofa, Takao Araki, Takao Araki, Minoru Nishida, Minoru Nishida, Takanori Hino, Takanori Hino, } "Development of multi layer ceramic capacitor by pulsed laser deposition", Proc. SPIE 4830, Third International Symposium on Laser Precision Microfabrication, (19 February 2003); doi: 10.1117/12.486580; https://doi.org/10.1117/12.486580

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