REKAM JEJAK KIMIA PERMUKAN SIO2 PRODUKSI FASILITAS TEKNOLOGI PEMURNIAN ZIRKONIUM PSTA

Muzakky Akhmad

DOI: http://dx.doi.org/10.17146/gnd.2018.21.1.3922

Sari


Abstrak

Rekam jejak kimia permukan SiO2 produksi fasilitas teknologi pemurnian zirkonium PSTA. Telah dilakukan rekam jejak kimia permukan SiO2 produksi fasilitas teknologi pemurnian zirkonium PSTA. Tujuan dari pelenilian ini adalah untuk melakukan merekaman jejak gugus silanol (≡Si-OH), siloksan (≡Si-O-Si≡) serta group air (OH) di permukaan produk hasil pemurnian SiO2gel. Sebagai parameter proses pemurnian dilakukan variable fungsi suhu, waktu dan konsentrasi asam HF.  Rekam jejak SiO2(gel) dilakukan dengan Fourier- transform infrared (FT-IR) spectroscopy  dan deteksi desorpsi pengotor Fe3+ memakai absorpsi serapan atom (AAS).  Hasil  Pemurnian SiO2(gel) dengan pelarut campuran HF dan HCl, sebaiknya dilakukan pada komposisi 1% HF dan 1N HCl pada suhu 80 oC selama 8 jam. Pada keadaan proses pemurnian 5%HF, suhu 100 oC dan waktu konatak 10 jam akan merusan gugus silanol, siloksan dan group air.  Rekam jejak FTIR pada hasil terdeteksi  puncak di panjang gelombang 3448 cm-1, 1635 cm-1, 1103 cm-1 dan 462 cm-1 yang merupakan karakteristik dari SiO2.  Dengan munculnya puncak disekitar panjang gelombang 1103 cm-1 dapat diprediksi cuplikan terdapat mineral jenis α quart.  Proses pemurnian SiO2(gel) yang dilakukan kondisi optimal, ternyata dapat menghilangkan pengotor dalam filtrat sebesar 60,4 ppm Fe3+

 


Kata Kunci


SiO2(gel), silanol, siloksan, group air, FTIR, AAS

Teks Lengkap:

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Referensi


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